Resistless Patterning of a Chlorine Monolayer on a Si(001) Surface with an Electron Beam

Publication year: 2011
Source: Applied Surface Science, In Press, Accepted Manuscript, Available online 13 June 2011

C., Jeon , H.-N., Hwang , H.-J., Shin , C.-Y., Park , C.-C., Hwang

We achieved electron beam (e-beam) patterning without a photoresist on a Clterminated Si(001) surface. Synchrotron radiation photoemission spectroscopy and scanning photoelectron microscopy were employed to investigate the surface chemical state and pattern formation. The Cl-Si bonds were easily broken by the irradiation with an e-beam of 1 keV, leading to a pattern formation through the adsorption of residual molecules of water and hydrocarbon at the exposed Si dangling bond sites. In addition, we demonstrated the selective adsorption of desired molecules on the surface by e-beam irradiation in environments consisting of different gases, such as oxygen, ammonia, and 1-butanethiol.